VLSI Placement and Global Routing Using Simulated Annealing by Carl Sechen

By Carl Sechen

From my B.E.E measure on the collage of Minnesota and throughout my S.M. measure at M.I.T., I had really good in sturdy country units and microelectronics. I made the choice to change to computer-aided layout (CAD) in 1981, just a 12 months or so sooner than the creation of the simulated annealing set of rules by way of Scott Kirkpatrick, Dan Gelatt, and Mario Vecchi of the IBM Thomas 1. Watson examine heart. simply because Prof. Alberto Sangiovanni-Vincentelli, my UC Berkeley consultant, have been a expert at IBM, I re­ ceived a duplicate of the unique IBM inner file on simulated annealing nearly the day of its unlock. Given my history in statistical mechanics and sturdy country physics, i used to be instantly inspired by way of this new combinatorial optimization process. As Prof. Sangiovanni-Vincentelli had prompt I paintings within the components of placement and routing, it was once in those geographical regions that I sought to discover this new set of rules. My flJ'St implementation of simulated annealing was once for an island-style gate array placement challenge. This paintings is gifted within the Appendix of this e-book. i used to be relatively struck by means of the impact of a nonzero temperature on what differently seems to be a random in­ terchange algorithm.

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Extra resources for VLSI Placement and Global Routing Using Simulated Annealing

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And Z). The placement and routing model for gate array. as well as other row-based images. 6. Essentially. the cells are indicated as rectangles of common heights and various widths. and are arranged in rows. The terminal or pin positions are indicated as points within the cell bOWldary. Most often. these points are located on the boundary of the cell. The pins are given a label which is the name of the signal or net to which the pin belongs. A set of pins having the same label must be electrically interconnected Gate arrays shorten and simplify the design process.

In practice, A is limited to a maximum value thereby implying that the original cell a is not moved if a reduction in total routing length could not be found in A steps. If no cell exists which can be moved with A steps, the placement is said to be A-optimum. The results yielded by this method seemed to be comparable to those given by force-directed pairwise relaxation, for nominal values of £ and A. 3 = = I M. Hanan, P. Wolff, and B. Agule, "Some Experimental Results on Plaoement Techniquel," (1976).

On the other hand, the degree of difficulty in tenns of fabrication is strongly related to the number of metal layers. 1 w. DeCamp, O. Sporzynski, and H. Burbank, "Oate Array and Standard Cell Approach," (1986). 6 I. -____ celiA B I I I roLw~1 I row 4 C :. I I__. ___ .... 3 A row-based gate array layout image. Since every chip contains the same pattern of transistors, regardless of its fWlction, the chips can be manufactured in volume. The metal personality is added only on demand for a particular fWlction.

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